Cleaning apparatus

Details Cleaning apparatus Cleaning apparatus

1997-10-21

1999-10-19

Chin, Randall E.

Brushing, scrubbing, and general cleaning

Machines

Brushing

15102, 15 882, 15 211, 15 883, A46B 1302

Patent

active

059667656

ABSTRACT:
A cleaning apparatus is used for cleaning a thin disk-shaped workpiece such as a semiconductor wafer, a liquid crystal display or the like. The cleaning apparatus comprises a support mechanism for supporting a workpiece and rotating the workpiece about its own axis, and a cleaning member for being in sliding contact with at least one of opposite surfaces of the workpiece. The support mechanism comprises a plurality of spindles, and a plurality of rotatable holding portions provided on upper ends of the spindles and having respective circumferential edges engageable with a circumferential edge of the workpiece. The plurality of spindles are clustered into groups around the workpiece, and two adjacent groups of the spindles are positioned to form a wide spacing between two adjacent groups of the spindles, and a path along which the workpiece is supplied to and removed from the support mechanism is positioned in the wide spacing.

REFERENCES:
patent: 4788994 (1988-12-01), Shinbara
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5361449 (1994-11-01), Akimoto
patent: 5421056 (1995-06-01), Tateyama et al.
patent: 5675856 (1997-10-01), Itzkowitz
patent: 5685039 (1997-11-01), Hamada et al.
patent: 5868866 (1999-02-01), Maekawa et al.
Patent Abstracts of Japan, vol. 096, No. 004, Apr. 30, 1996 & JP 07 335599 A (Dainippon Screen Mfg. Co. Ltd.), Dec. 22, 1995, * abstract; figures 12-14, 16-20 * figures 24, 25, 27 *.
Pending U.S. Patent Application Serial No. 08/609,686, filed Mar. 1, 1996, entitled "Method of and Apparatus for Cleaning Workpiece", located in Group Art Unit 1743, by Toshiro Maekawa et al.

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