Cleaning apparatus

Details Cleaning apparatus Cleaning apparatus

1999-03-26

2000-07-25

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134157, 134172, 134902, 134198, 118321, 239264, B08B 302

Patent

active

060925426

ABSTRACT:
A cleaning apparatus is used for cleaning a substrate such as a semiconductor wafer, a glass substrate, or a liquid crystal panel with a cleaning member. The cleaning apparatus includes: a holding mechanism for holding a workpiece, an arm movable relative to the workpiece, a cleaning member mounted on the arm for cleaning the workpiece held by the holding mechanism, a moving mechanism for vertically moving the cleaning member with respect to the workpiece held by the holding mechanism, and a controller for controlling the moving mechanism to adjust the cleaning member to a setting height.

REFERENCES:
patent: 4326553 (1982-04-01), Hall
patent: 5718763 (1998-02-01), Tateyama et al.
patent: 5762708 (1998-06-01), Motoda et al.

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