Cleaning apparatus

Details Cleaning apparatus Cleaning apparatus

1992-03-11

1995-01-10

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134902, B08B 310

Patent

active

053797850

ABSTRACT:
A cleaning apparatus and a cleaning method effectively clean the entire surface of a substrate to be cleaned by uniformly irradiating ultrasonic waves to the substrate. Ultrasonic waves generated by an ultrasonic oscillator provided on the side wall of an outer tank are transmitted through an ultrasonic wave transmission medium provided between the outer tank and an inner tank, for example, water, and are irradiated on a substrate to be cleaned, for example, a semiconductor wafer, in the inner tank through a cleaning chemical in the inner tank. By irradiating the ultrasonic waves from the side of the cleaning apparatus, a support base blocks the least amount of ultrasonic waves from reaching the substrate. This is effective to uniformly clean the substrate.

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