Cleaning and drying apparatus, wafer processing system and wafer

Details Cleaning and drying apparatus, wafer processing system and wafer Cleaning and drying apparatus, wafer processing system and wafer

1998-03-24

2000-05-30

Coe, Phillip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 61, 134 952, 1341023, 134107, 134133, 134902, B08B 304

Patent

active

060680024

ABSTRACT:
A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O-ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.

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patent: 5311891 (1994-05-01), Uchino
patent: 5331987 (1994-07-01), Hayashi et al.
patent: 5370142 (1994-12-01), Nishi et al.
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5569330 (1996-10-01), Schild et al.
patent: 5845660 (1998-12-01), Shindo et al.

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