Cleaning and drying apparatus for substrate holder chuck and...

Details Cleaning and drying apparatus for substrate holder chuck and... Cleaning and drying apparatus for substrate holder chuck and...

2004-08-19

2009-08-25

Stinson, Frankie L (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

Reexamination Certificate

active

07578304

ABSTRACT:
A cleaning and drying apparatus is provided for a substrate holder chuck equipped with a holding members31(32, 33) having a plurality of holding grooves31a(32a,33a) for holding a plurality of wafers W respectively. The apparatus includes a atomize nozzle50for spraying N2-gas and deionized water to the holding grooves31aof the holding member31of the chuck30, a cleaning-liquid nozzle60for spraying deionized water to a side face31bof the holding member31and an air cylinder300for causing relative movement between the atomize nozzle50/the cleaning-liquid nozzle60and the holding member31of the chuck30, along the longitudinal direction of the holding member31and horizontally. Due to driving of the air cylinder300, the atomize nozzle50is constructed so as to spray N2-gas and deionized water to the holding grooves31aof the holding member31in advance of the cleaning-liquid nozzle60. Accordingly, it is possible to shorten a cleaning-and-drying period for the substrate holder chuck and also possible to improve a throughput of the whole apparatus.

REFERENCES:
patent: 4619845 (1986-10-01), Ayers et al.
patent: 4957783 (1990-09-01), Gabryszewski
patent: 5226437 (1993-07-01), Kamikawa et al.
patent: 5253663 (1993-10-01), Tanaka et al.
patent: 5379784 (1995-01-01), Nishi et al.
patent: 5896875 (1999-04-01), Yoneda
patent: 2002/0130106 (2002-09-01), Mertens et al.
patent: 2000-012668 (1998-06-01), None

Affiliated with

Also associated with

Rating

Cleaning and drying apparatus for substrate holder chuck and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning and drying apparatus for substrate holder chuck and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning and drying apparatus for substrate holder chuck and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4111531