Cleaning and drying apparatus for objects to be processed

Details Cleaning and drying apparatus for objects to be processed Cleaning and drying apparatus for objects to be processed

1998-06-12

2000-12-26

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 952, 134200, 134902, 34229, B08B 302

Patent

active

061642975

ABSTRACT:
A cleaning and drying apparatus includes a cleaning bath 22 for collecting cleaning liquid for wafers, a drying chamber 23 arranged above the cleaning bath 22 to dry the wafers, a shutter 36 positioned between the cleaning bath 22 and the drying chamber 23 to define them communicably, a opening and closing mechanism 54 arranged outside a processing container to open and close the shutter 36, a connecting member 58 extending through an opening formed in an outer wall of the container to connect the shutter 36 with the mechanism 54, and a liquid sealing mechanism 60 for sealing the opening with sealing liquid. Another cleaning and drying apparatus is also provided with a wafer boat 24 for arranging the wafers at intervals horizontally and carrying the wafers, the drying chamber 23 which accommodate the wafers together with the wafer boat 24 for drying the wafers, dry-gas nozzles 37 for supplying dry gas to the wafers and a moving unit for moving the wafers in relation to the nozzles 37.

REFERENCES:
patent: 4132567 (1979-01-01), Blackwood
patent: 4286541 (1981-09-01), Blackwood
patent: 4911761 (1990-03-01), McConnell et al.
patent: 5222310 (1993-06-01), Thompson et al.
patent: 5409310 (1995-04-01), Owczarz
patent: 5431178 (1995-07-01), Chiu
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5569330 (1996-10-01), Schild et al.
patent: 5571337 (1996-11-01), Mohindra et al.
patent: 5666985 (1997-09-01), Smith, Jr. et al.
patent: 5738128 (1998-04-01), Thompson et al.
patent: 5752532 (1998-05-01), Schwenkler
patent: 5896875 (1999-04-01), Yoneda

Affiliated with

Also associated with

Rating

Cleaning and drying apparatus for objects to be processed does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning and drying apparatus for objects to be processed, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning and drying apparatus for objects to be processed will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-984584