Cleaning agents for fabricating integrated circuits and a proces

Details Cleaning agents for fabricating integrated circuits and a proces Cleaning agents for fabricating integrated circuits and a proces

1991-10-11

1993-05-25

Garvin, Patrick P.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 41, 252142, C23G 102

Patent

active

052136221

ABSTRACT:
This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process comprises contacting the surface to be cleaned with an effective amount of a cleaning agent comprising a carboxylic acid selected from acetic acid or formic acid at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surface of the substrate providing a clean, substantially residue-free surface.

REFERENCES:
patent: 4714517 (1987-12-01), Malladi et al.
patent: 4900363 (1990-02-01), Brehm et al.

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