Compositions – Fluent dielectric – N-containing
Patent
1993-07-16
1996-01-23
Lieberman, Paul
Compositions
Fluent dielectric
N-containing
252153, 252162, 252170, 252171, 25217421, 252DIG8, C11D 732, C11D 726, C11D 750, C23G 5036, C23G 502
Patent
active
054863147
ABSTRACT:
A cleaning agent composition and method, especially for cleaning electronic components, optical parts, and circuit boards. The liquid agent is completely CFC-free and biologically harmless. The composition includes a dipropylene glycol monoether and one or more of the following: N-alkyl-lactam; dihydro-2(3H)-furanone; a polypropylene glycol ether; R.sub.4 --CH(--OH)--CH.sub.2 --NH.sub.2 ; N(R.sub.5).sub.3 ; R.sub.6 --N[(CH.sub.2 CH.sub.2 O).sub.n H] wherein R.sub.4 is a chain of 1-6 carbons, R.sub.5 is a chain of 2-18 carbons, R.sub.6 is a chain of 8-18 carbons and n is a number between 2 and 25.
REFERENCES:
patent: 4592787 (1986-06-01), Johnson
patent: 5015410 (1991-05-01), Sullivan
patent: 5034148 (1991-07-01), Black
patent: 5106525 (1992-04-01), Sullivan
patent: 5190595 (1993-03-01), Ameen et al.
Leiterplattentechnik, Galvanotechnik, D-7968 Saulgau, 83 (1992) Nr. 4 entitled "FCKW-freie Reinigung: Medien-Anlagen-Konzepte" by Dr. M. Hanek & Dr. R. Schreinert, D-8070 Ingolstadt, pp. 1370-1380.
Hanek Martin
Wack Oskar K.
Douyon Lorna M.
Lieberman Paul
O. K. Wack Chemie GmbH
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