Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-02-06
2007-02-06
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C510S365000
Reexamination Certificate
active
10500752
ABSTRACT:
The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.
REFERENCES:
patent: 3666473 (1972-05-01), Colom et al.
patent: 4115128 (1978-09-01), Kita
patent: 4165295 (1979-08-01), Vander Mey
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4215005 (1980-07-01), Vander Mey
patent: 4221674 (1980-09-01), Vander Mey
patent: 4395348 (1983-07-01), Lee
patent: 4403029 (1983-09-01), Ward et al.
patent: 4749510 (1988-06-01), Nelson
patent: 5098591 (1992-03-01), Stevens
patent: 5288335 (1994-02-01), Stevens
patent: 5346640 (1994-09-01), Leys
patent: 5472830 (1995-12-01), Honda
patent: 5507978 (1996-04-01), Honda
patent: 5545353 (1996-08-01), Honda et al.
patent: 5554312 (1996-09-01), Ward
patent: 5561105 (1996-10-01), Honda
patent: 5597678 (1997-01-01), Honda et al.
patent: 5612303 (1997-03-01), Takayanagi et al.
patent: 5612304 (1997-03-01), Honda et al.
patent: 5962383 (1999-10-01), Doyel et al.
patent: 5988186 (1999-11-01), Ward et al.
patent: 6017862 (2000-01-01), Doyel et al.
patent: 6060439 (2000-05-01), Doyel et al.
patent: 6130195 (2000-10-01), Doyel et al.
patent: 6323169 (2001-11-01), Abe et al.
patent: 6368421 (2002-04-01), Oberlander et al.
patent: 6531436 (2003-03-01), Sahbari et al.
patent: 0 065 381 (1982-11-01), None
patent: 0 376 687 (1990-07-01), None
patent: WO 03/058350 (2003-07-01), None
Choi Kyung-Soo
Kang Doek-Man
Oh Sae-Tae
Az Electronic Materials USA Corp.
Jain Sangya
Webb Gregory
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