Cleaning agent and cleaning process for harmful gas

Details Cleaning agent and cleaning process for harmful gas Cleaning agent and cleaning process for harmful gas

1996-07-10

1999-03-16

Lewis, Michael

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

502400, 502402, B01D 5368, B01J 2004

Patent

active

058826157

ABSTRACT:
There are disclosed a cleaning agent for removing a fluorine-compound gas such as hydrogen fluoride, fluorine, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride which agent comprises a molded article produced by using strontium hydroxide as a principal component, an organic binding agent as a molding agent and the hydroxide of an alkaline earth metal other than strontium as a molding aid; and a process for cleaning a harmful gas which comprises feeding a harmful gas containing a fluorine-compound gas into a column packed inside with the above cleaning agent to remove the fluorine-compound gas; and exhausting a gas substantially free from the fluorine-compound gas. The above cleaning agent is capable of removing the fluorine-compound gas in high efficiency without causing any danger, thereby making itself well suited to the cleaning of the gases exhausted, for example, from semiconductor manufacturing industries.

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patent: 5338709 (1994-08-01), Planes
patent: 5670445 (1997-09-01), Kitahara et al.
patent: 5688479 (1997-11-01), Chao

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