Gas separation – Combined or convertible – In environmental air enclosure
Reexamination Certificate
2005-03-22
2005-03-22
Pham, Minh-Chau T. (Department: 1724)
Gas separation
Combined or convertible
In environmental air enclosure
C055SDIG001, C055SDIG007, C454S187000, C454S228000, C414S217000, C414S222020, C414S940000
Reexamination Certificate
active
06869457
ABSTRACT:
A clean room has an equipment installation area where an apparatus for treating an object to be treated such as a semiconductor wafer is installed, a process area4where the object is loaded in or unloaded from the apparatus, and an operation area where operations of the apparatus are executed. The equipment installation area, the process area and the operation area are arranged horizontally in the above-stated order and separated by partitions. These areas are air-conditioned independently of one another. The clean room is thus capable of preventing contamination of the object and a running cost of chemical filters in the clean room is reduced.
REFERENCES:
patent: 4549472 (1985-10-01), Endo et al.
patent: 4676144 (1987-06-01), Smith, III
patent: 5058491 (1991-10-01), Wiemer et al.
patent: 5096477 (1992-03-01), Shinoda et al.
patent: 5344365 (1994-09-01), Scott et al.
patent: 5626820 (1997-05-01), Kinkead et al.
patent: 5876280 (1999-03-01), Kitano et al.
patent: 5928077 (1999-07-01), Kisakibaru
patent: 5997398 (1999-12-01), Yamada et al.
patent: 6033301 (2000-03-01), Suwa
patent: 6151903 (2000-11-01), Hironaka
patent: 6183358 (2001-02-01), Adair, Jr.
patent: 6264550 (2001-07-01), Matsumoto
patent: 6347990 (2002-02-01), Sung et al.
patent: 6358139 (2002-03-01), Renz
patent: 6368208 (2002-04-01), Minoshima
patent: 6372042 (2002-04-01), Sung et al.
patent: 1106887 (1995-08-01), None
patent: 1177709 (1998-04-01), None
patent: 10-96332 (1998-04-01), None
patent: 10-096332 (1998-04-01), None
patent: 10-106909 (1998-04-01), None
patent: 1998-066381 (1998-10-01), None
patent: 1999-0086121 (1999-12-01), None
Taiwanese Office Action
Korean Office Action dated Dec. 12, 2003 (along English translation thereof).
Chinese Office Action dated Nov. 14, 2003 (along English translation thereof).
Nixon & Vanderhye P.C.
Pham Minh-Chau T.
Sharp Kabushiki Kaisha
LandOfFree
Clean room for semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Clean room for semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Clean room for semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3438974