1985-10-11
1987-09-15
Joyce, Harold
55385A, 98 401, 98 4202, F24F 900
Patent
active
046931732
ABSTRACT:
A clean room wherein clean air obtained through filters from the upper portion of the clean room is blown toward the floor, through the openings in the floor, and with the clean air being discharged again through the filters from the upper portion of the clean room. The air flow rate of clean air in the aisle areas is greater than the air flow rate in the wafer handling areas, and the opening rate of the floor is smaller in the portion near to an air return under the floor than in the portion remote from the air return thereby greatly reducing the diffusion of dust to the wafer handling areas.
REFERENCES:
patent: 3367257 (1968-02-01), Raider et al.
patent: 3986850 (1976-10-01), Wilcox
patent: 4549472 (1985-10-01), Endo et al.
Asai Shojiro
Asami Kinichiro
Maki Michiyoshi
Saiki Atsushi
Sunami Hideo
Hitachi , Ltd.
Hitachi Plant Engineering & Construction Co. Ltd.
Joyce Harold
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