Clean process to destroy arsenic-containing organic compounds wi

Details Clean process to destroy arsenic-containing organic compounds wi Clean process to destroy arsenic-containing organic compounds wi

1994-07-21

1996-08-13

Langel, Wayne

Hazardous or toxic waste destruction or containment

Containment

Solidification, vitrification, or cementation

75706, 423 87, 423645, 588200, 588236, C22B 3004

Patent

active

055458009

ABSTRACT:
A reduction method is provided for the treatment of arsenic-containing organic compounds with simultaneous recovery of pure arsenic. Arsenic-containing organic compounds include pesticides, herbicides, and chemical warfare agents such as Lewisite. The arsenic-containing compound is decomposed using a reducing agent. Arsine gas may be formed directly by using a hydrogen-rich reducing agent, or a metal arsenide may be formed using a pure metal reducing agent. In the latter case, the arsenide is reacted with an acid to form arsine gas. In either case, the arsine gas is then reduced to elemental arsenic.

REFERENCES:
patent: 3428428 (1969-02-01), Miederer et al.
patent: 3966412 (1976-06-01), Stroterhoff et al.
patent: 4631183 (1986-12-01), Lalancette et al.
patent: 4744917 (1988-05-01), Scardera et al.
patent: 4784699 (1988-11-01), Cowsar et al.
patent: 4842746 (1989-06-01), Fowler et al.
patent: 5156827 (1992-10-01), Tom et al.
Kirk-Othmer, Encyclopedia of Chemical Technology, Third Edition, vol. 3 (1978), John Wiley & Sons, pp. 243, 244, 251-253.
Chemical Abstracts 105:182978 (1986).

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