Clean laser cutting of metal lines on microelectronic circuit su

Electric heating – Metal heating – By arc

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21912184, 29847, B23K 2616

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active

055391745

ABSTRACT:
A laser is used to cut or "zap" unwanted sections of an aluminum interconnect metallization pattern on a microelectronic circuit substrate. Vaporized aluminum forms a cloud above the substrate that is reacted with a gas to form a substance which can be prevented from solidifying and forming a conductive residue on the substrate that could create a short circuit in the metallization pattern. The gas can be pressurized oxygen, in which case the reactant substance is electrically insulative aluminum oxide that forms a desirable sealing coating over the cut area. The aluminum oxide has a lower density than aluminum, and expands in the cut area to form a hermetic seal with the facing edges of the metallization pattern. Alternatively, the gas can be chlorine or other material which forms a residue that can be easily removed using a solvent such as water.

REFERENCES:
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patent: 3866398 (1975-02-01), Vernon, Jr. et al.
patent: 4691078 (1987-09-01), Nishioka et al.
patent: 4720620 (1988-01-01), Arima
patent: 5334280 (1994-08-01), Anthony et al.
Janal, Meir, "Technologies for Economic Production of ASICs", Mar. 1993 Solid State Technology at pp. 35, 36, 38.

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