Clathrate structure for electronic and electro-optic application

Details Clathrate structure for electronic and electro-optic application Clathrate structure for electronic and electro-optic application

1997-05-15

2000-08-15

Jones, Deborah

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

428446, 428450, B32B 904

Patent

active

061034037

ABSTRACT:
A method including the steps of (a) depositing a metal layer on a selected portion of a silicon substrate under a first set of predetermined conditions to form an metal silicide layer and an intermediate n-type silicon layer; and (b) exposing the metal silicide layer and the n-type silicon layer to a second set of predetermined conditions to form a silicon clathrate film on the selected portion of the silicon substrate, where the intermediate n-type silicon layer acts to bond the silicon clathrate to the silicon substrate to form a silicon clathrate structure.

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