Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2011-08-30
2011-08-30
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S056000, C716S111000, C716S112000, C716S119000, C716S136000
Reexamination Certificate
active
08010914
ABSTRACT:
A circuit structure of an integrated circuit is provided. The circuit structure is adapted for a circuit layout of a wafer. The circuit structure at least includes a first array cell and a second array cell. The second array cell and the first array cell are connected to each other and have a connecting area, wherein the second array cell is shifted a distance along the connecting area. Therefore, the result of yield enhancement is achieved.
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Dinh Paul
Inotera Memories, Inc.
Jianq Chyun IP Office
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