Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1990-05-01
1993-06-01
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250306, 2504923, G01N 2300
Patent
active
052162540
ABSTRACT:
An apparatus for forming a predetermined circuit pattern on a circuit substrate by using a .mu.-STM write head, the .mu.-STM write head comprising a write head substrate having a flat surface, a plurality of micro chip electrodes formed upright on the flat surface of the write head substrate and constituting a .mu.-STM, a level of a distal end of each of the chip electrodes being set to be constant, and scanning means for scanning the micro chip electrodes on the circuit substrate by moving the micro chip electrodes and the circuit substrate relative to each other in two-dimensional directions.
REFERENCES:
patent: 4477729 (1984-10-01), Chang et al.
patent: 4668865 (1987-05-01), Gimzewski et al.
patent: 4785189 (1988-11-01), Wells
patent: 4831614 (1989-05-01), Duerig et al.
patent: 4906840 (1990-03-01), Zdeblick et al.
patent: 4912822 (1990-04-01), Zdeblick et al.
patent: 4968390 (1990-11-01), Bard et al.
patent: 4998016 (1991-03-01), Nose et al.
patent: 5015850 (1991-05-01), Zdeblick et al.
patent: 5043577 (1991-08-01), Pohl et al.
Chang et al., "Nanostructure Technology" IBM J. Res. Develop vol. 32 No. 4 Jul. 1988.
Applied Physics Letter, vol. 51, No. 4, Jul. 27, 1987, pp. 247-249, article entitled "Direct Writing of Submicron Metallic Features with a Scanning Tunneling Microscope" by R. M. Silver, et al.
Isono Yasuo
Kajimura Hiroshi
Kouchi Toshihito
Mimura Yoshiyuki
Ohta Hiroko
Berman Jack I.
Beyer James
Olympus Optical Co,. Ltd.
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