Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-01-03
2009-12-15
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07632614
ABSTRACT:
A circuit pattern exposure method for irradiating illumination light onto a mask to transfer (offset) mask patterns that are formed in the mask to a semiconductor substrate, wherein the mask includes a plurality of main mask patterns that are arranged at a prescribed pitch and auxiliary mask patterns that are arranged outside the outermost main mask pattern and that are not to be transferred (offset) to the semiconductor substrate; the auxiliary mask patterns are provided with a first auxiliary mask row that is arranged adjacent to the outermost main mask pattern and a second auxiliary mask row that is arranged adjacent to the first auxiliary mask row; and the first auxiliary mask row and the second auxiliary mask row are arranged at a pitch that is narrower than the pitch of arrangement of the main mask patterns.
REFERENCES:
patent: 6074787 (2000-06-01), Takeuchi
patent: 6620556 (2003-09-01), Ohsaki
patent: 04-268714 (1992-09-01), None
patent: 05-002261 (1993-01-01), None
patent: 10-186629 (1998-07-01), None
patent: 2002-116529 (2002-04-01), None
patent: 2004-272228 (2004-09-01), None
Kosa Nobue
Yasuzato Tadao
Elpida Memory Inc.
Rosasco Stephen
Young & Thompson
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