Circuit device and manufacturing method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S678000, C257S691000, C257SE23098, C257SE25031, C257S707000, C257S730000, C257S731000

Reexamination Certificate

active

07446406

ABSTRACT:
A circuit device includes a ceramic substrate, an Al wiring layer provided on the ceramic substrate, and a semiconductor device and a bus bar which are electrically connected to the wiring layer. On part of the wiring layer, a Ni layer is plated. Thus a coated region in which the wiring layer is coated with nickel having solder wetability superior to aluminum and an exposing region in which the wiring layer is exposed as viewed from above the ceramic substrate are provided. The semiconductor device is connected onto the Ni layer within the coated region through solder. The bus bar is ultrasonically bonded to the wiring layer within the exposing region as viewed from above the ceramic substrate. Thus, the circuit device including the semiconductor device and the bus bar that are bonded to the ceramic substrate by sufficient bonding strength and its manufacturing method are provided.

REFERENCES:
patent: 4172261 (1979-10-01), Tsuzuki et al.
patent: 6166937 (2000-12-01), Yamamura et al.
patent: 6670216 (2003-12-01), Strauch
patent: 6798060 (2004-09-01), Strauch
patent: 2002/0112882 (2002-08-01), Hirakawa
patent: 2003/0112605 (2003-06-01), Hable
patent: 1 187 198 (2002-03-01), None
patent: 2003-060129 (2003-02-01), None
patent: 1 416 533 (2004-05-01), None
patent: 11-195725 (1999-07-01), None
patent: 11-346037 (1999-12-01), None
patent: 2000-232189 (2000-08-01), None
patent: 2002-009190 (2002-01-01), None
patent: 2002-164461 (2002-06-01), None
patent: 2003-188310 (2003-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Circuit device and manufacturing method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Circuit device and manufacturing method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Circuit device and manufacturing method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4022281

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.