Circuit configuration for the recognition of a plasma

Details Circuit configuration for the recognition of a plasma Circuit configuration for the recognition of a plasma

1989-06-09

1991-06-18

Paschall, M. H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

21912154, 21912157, 21912143, 156345, 20429832, 20429838, B23K 900

Patent

active

050251350

ABSTRACT:
The invention relates to a circuit configuration for the recognition of a plasma which is supplied with energy by means of an ac current of preset frequency. This ac current is detected by way of a suitable sensor and feeds to a highpass filter. This highpass filter permits those frequencies to pass through which lie above the preset frequency. The output signal of the highpass filter is rectified through a rectifier, freed of its residual ripple through a lowpass filter, and supplied to an evaluation device.

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patent: 4656331 (1987-04-01), Lillquist et al.
"Plasma Potentials of 13.56 MHz RF Argon Glow Discharges in a Planar System", pp. 59-65, J. Appl. Phys., 57(1), Jan. 1, 1985.
Electrostatic Probe Analysis of Microwave Plasmas Used for Polymer Etching, pp. 348-354, J. Vac. Science & Technology, Jan. 1987.
"Plasma Etching Semiconductor Fabrication", Russ, Morgan, 1985, pp. 203-239.

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