Circuit board, process for producing the same and a power...

Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C216S013000, C029S847000

Reexamination Certificate

active

07008549

ABSTRACT:
Composite member2consisting of ceramic insulator substrate3and two metal layers4A and4B such as aluminum sheets is subjected to milling in order to remove the unwanted areas of metal layer4A (where inter-element spacings are to be formed). In order to suppress cracking due to substrate warpage, a small bottom portion of4A is left intact as residual metal layer4Aa which is preferably removed by etching. Milling is performed after thin-film layer of etching resist5is applied to the surface of metal layer4A. By milling in two stages, a step is formed at the bottom of lateral sides of a pattern element to make a skirt which contributes to reducing external stresses.

REFERENCES:
patent: 3756052 (1973-09-01), Quaal et al.
patent: 4325780 (1982-04-01), Schulz, Sr.
patent: 4548285 (1985-10-01), Sells et al.
patent: 4919232 (1990-04-01), Lofton
patent: 5602865 (1997-02-01), Laakmann
patent: 5666722 (1997-09-01), Tamm et al.
patent: 5688408 (1997-11-01), Tsuru et al.
patent: 6134117 (2000-10-01), Funk et al.
patent: 05031616 (1993-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Circuit board, process for producing the same and a power... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Circuit board, process for producing the same and a power..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Circuit board, process for producing the same and a power... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3600498

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.