Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-12-18
2007-12-18
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C439S706000, C347S062000, C216S016000
Reexamination Certificate
active
10929492
ABSTRACT:
Provided is a method for manufacturing a circuit board including an electrode wiring formed above a surface portion of a substrate, and a plurality of electrothermal converting elements which have a heating resistor film for generating thermal energy formed above the electrode wiring. The method includes: forming an electrode wiring layer for forming the electrode wiring, forming the heating resistor film; and collectively etching the electrode wiring layer and the heating resistor film to thereby form the electrode wiring. With the method according to the present invention, the circuit board can be manufactured with a higher density, higher endurance, and lower power consumption recording head to provide high resolution images.
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patent: 6774397 (2004-08-01), Arao et al.
patent: 7053538 (2006-05-01), Ha et al.
patent: 2003/0234833 (2003-12-01), Kim
patent: 9-11468 (1997-01-01), None
Kamiichi Masato
Sasaki Keiichi
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Vinh Lan
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