Chromium target and process for producing the same

Details Chromium target and process for producing the same Chromium target and process for producing the same

1996-03-29

1998-02-17

Sheehan, John

Metal treatment

Process of modifying or maintaining internal physical...

Heating or cooling of solid metal

148423, 75245, 419 28, 419 29, C22C 118

Patent

active

057187789

ABSTRACT:
A chromium target is disclosed for use in the formation of chromium films or sheets of reduced thickness by means of sputtering. The target has a recrystallized structure represented by the equation, A/B.ltoreq.0.6, where A is the diffraction intensity of the (110) planes as determined by X-ray diffraction of a sputtered surface, and B is the diffraction intensity as determined from the sum of the (110), (200) and (211) planes. The target preferably has a deflective strength of above 500 MPa and an average crystal grain of below 50 .mu.m. The chromium target is produced by subjecting a starting chromium material to at least one stage of plastic working at a temperature of not higher than 1,000.degree. C., and subsequently by heat-treating the resulting chromium material for recrystallization at a temperature of higher than the recrystallization temperature of the chromium material but not higher than 1,200.degree. C.

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