Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating
Reexamination Certificate
2006-05-30
2006-05-30
Wong, Edna (Department: 1753)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal coating
C205S289000
Reexamination Certificate
active
07052592
ABSTRACT:
An electrolyte bath and method of electrolytically plating a layer of metallic chromium on a substrate comprises providing an electrolyte bath of a trivalent chromium, passing a current through the bath from an anode to a cathode which receives the substrate, maintaining the electrolyte bath at a desired temperature and a desired pH and depositing the trivalent chromium onto the substrate at a desired rate.
REFERENCES:
patent: 4359345 (1982-11-01), Da Fonte, Jr.
patent: 4612091 (1986-09-01), Benaben et al.
patent: 5560815 (1996-10-01), Sekimoto et al.
patent: 5868917 (1999-02-01), Benaben
patent: 6251254 (2001-06-01), Katoh et al.
patent: 6319385 (2001-11-01), Mull
patent: 2003/0148122 (2003-08-01), Oshima et al.
patent: 2003/0217787 (2003-11-01), Parkos et al.
Edigaryan et al., “Effect of Fluoride Ions on Chromium Deposition From Sulfuric Acid Solutions of Cr(III)”, Protection of Metals, vol. 35, No. 1, c. (no month) 1999, pp. 1-3. Translated FromZachchita metallov, vol. 35, No. 1, pp. 5-7.
Gueguine Yedigarian
Leonid Kuzmin
St. Onge Steward Johnston & Reens LLC
Wong Edna
LandOfFree
Chromium plating method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chromium plating method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chromium plating method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3594847