Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-02-12
2009-12-22
Mc Ginty, Douglas (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C438S008000, C438S494000, C438S745000, C438S752000, C438S753000, C438S689000, C134S001300, C134S041000, C134S042000
Reexamination Certificate
active
07635670
ABSTRACT:
The present invention relates to a novel etching solution suitable for characterizing defects on semiconductor surfaces, including silicon germanium surfaces, as well as a method for treating semiconductor surfaces with an etching solution as disclosed herein. This novel etching solution is chromium-free and enables a highly sufficient etch rate and highly satisfactory etch results.
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Ginty Douglas Mc
S.O.I.Tec Silicon on Insulator Technologies
Winston & Strawn LLP
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