Chromeless photomask and exposure apparatus including the...

Details Chromeless photomask and exposure apparatus including the... Chromeless photomask and exposure apparatus including the...

2006-08-01

2006-08-01

Rosasco, S. (Department: 1756)

Photocopying

Projection printing and copying cameras

C355S053000, C430S005000

Reexamination Certificate

active

07084950

ABSTRACT:
A chromeless photomask includes a main pattern portion and a complementary pattern portion formed in the surface of the transparent mask substrate adjacent to an outer peripheral edge of the main pattern portion. The main and complementary pattern portions are each formed by recessing a surface of a transparent mask substrate to produce respective protrusions and recesses that induce a phase difference of 180 degrees in light rays passing therethrough. The complementary pattern portion is designed to produce interference that prevents distortion in the photoresist pattern formed at a region by and corresponding to the edge of the main pattern portion of the photomask. Accordingly, the present invention provides for a relatively large secondary mask alignment margin.

REFERENCES:
patent: 2004/0063000 (2004-04-01), Maurer et al.
patent: 2004/0197674 (2004-10-01), Bailey et al.
patent: 2002-0058287 (2002-07-01), None
patent: WO 01/63864 (2001-08-01), None

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