Chromeless phase shift mask using non-linear optical materials

Details Chromeless phase shift mask using non-linear optical materials Chromeless phase shift mask using non-linear optical materials

2005-03-08

2005-03-08

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06864020

ABSTRACT:
An attenuated phase shift mask is formed using a non-linear optical material for both fiducial features and pattern features. The non-linear optical material selected has predetermined transmission at the actinic exposure wavelength and a smaller transmission at the fiducial recognition wavelengths.

REFERENCES:
patent: 6721040 (2004-04-01), Saito et al.

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