Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-10-03
2006-10-03
Chawan, Sheela (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S149000, C356S237400, C250S559450, C430S005000
Reexamination Certificate
active
07116815
ABSTRACT:
A chrome-less mask inspection method is provided. The chrome-less mask at least includes a transparent region and a phase shift region. The method includes providing a database having a mask database corresponding to the chrome-less mask. The mask database further includes a frame line pattern having enclosed area and pattern that corresponds to enclosed area and pattern of the phase shift region of the chrome-less mask and a first inspection signal pattern generated by the mask database. An inspecting device is also provided to inspect a second inspection signal pattern from the chrome-less mask. Furthermore, scanning location of the second inspection signal pattern corresponds with scanning location of the first inspection signal pattern. Thereafter, the first inspection signal pattern and the second inspection signal pattern is compared and any differences are registered.
REFERENCES:
patent: 6221538 (2001-04-01), Kerszykowski et al.
patent: 6388736 (2002-05-01), Smith et al.
patent: 6396944 (2002-05-01), Kung
patent: 6541167 (2003-04-01), Petersen et al.
patent: 6986972 (2006-01-01), Rissman
Chen Ming-Jui
Lin Chin-Lung
Chawan Sheela
J.C. Patents
United Microelectronics Corp.
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