Measuring and testing – Gas analysis – Gas chromatography
Reexamination Certificate
2006-02-22
2008-11-18
Larkin, Daniel S (Department: 2856)
Measuring and testing
Gas analysis
Gas chromatography
C073S023350, C073S023410
Reexamination Certificate
active
07451634
ABSTRACT:
An improved chromatographic method for measuring impurities in a gas sample that allows extraction of a peak of impurity masked by the sample background. An impurity peak is extracted from the sample background and put in a second sample loop and the second sample loop volume is injected into a second separation column. A “slice” is taken from the sample background to fill the second sample loop and the “slice”, whose width is preferably substantially equal to the impurities peak width, is injected into the second separation column. Another embodiment allows concentration of a predetermined impurity, thereby providing an improved precision on the results. The chromatographic method provides an improved measure of argon in oxygen, oxygen in argon and oxygen in hydrogen.
REFERENCES:
patent: 3425807 (1969-02-01), Levy
patent: 4271697 (1981-06-01), Mowery, Jr.
patent: 4536199 (1985-08-01), Toon
patent: 4780116 (1988-10-01), Cheh et al.
patent: 5152176 (1992-10-01), Bryselbout et al.
patent: 5360467 (1994-11-01), Ketkar et al.
patent: 6000274 (1999-12-01), Lai et al.
patent: 6341520 (2002-01-01), Satoh et al.
patent: 6474136 (2002-11-01), Nishina et al.
patent: 2004/0182134 (2004-09-01), Staphanos et al.
patent: 2004/0234414 (2004-11-01), Bezzola
patent: WO 2004/083848 (2004-09-01), None
Fortier André´
Gamache Yves
Darby & Darby PC
Larkin Daniel S
Systeme Analytique Inc.
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