Chemistry of inorganic compounds – Halogen or compound thereof – Chlorine dioxide
Patent
1992-10-23
1995-07-18
Fuller, Benjamin R.
Chemistry of inorganic compounds
Halogen or compound thereof
Chlorine dioxide
423477, 423241, C01B 1102
Patent
active
054339383
ABSTRACT:
An improvement is provided in a process for the preferential removal of chlorine from an aqueous solution of chlorine dioxide and chlorine which has been prepared by the process of reducing a chlorate with a reducing agent in a strong acid, and wherein the gases produced thereby are dissolved in water. The improvement comprises the step of adding hydrogen peroxide, oxalic acid or a salt of oxalic acid, to a cool (i.e. at a temperature of about 0.degree. C. to about 25.degree. C.) aqueous solution of the chlorine within a period of less than 2.5 hours dioxide and chlorine. Substantially all of the chlorine is destroyed with almost no destruction of the chlorine dioxide.
REFERENCES:
patent: 2036311 (1936-04-01), White
patent: 2036375 (1936-04-01), Vincent
patent: 2043284 (1936-06-01), Cunningham et al.
patent: 2078045 (1937-04-01), Vincent
patent: 2317443 (1943-04-01), Cummingham
patent: 2335808 (1943-11-01), Soule
patent: 2481241 (1949-09-01), Rapson et al.
patent: 2641528 (1953-06-01), Audoynaud
patent: 2833624 (1958-05-01), Sprauer
patent: 2861871 (1958-11-01), Germano
patent: 2871097 (1959-01-01), Rapson
patent: 3607027 (1971-09-01), Westerlund
patent: 4010112 (1977-03-01), Cowley et al.
patent: 4137296 (1979-01-01), Glew et al.
patent: 4216195 (1980-08-01), Jaszka et al.
patent: 4393035 (1983-07-01), Fredette
patent: 4393036 (1983-07-01), Fredette
patent: 4421730 (1983-12-01), Isa et al.
patent: 4543243 (1985-09-01), Frohler et al.
patent: 5154910 (1992-10-01), Engstrom
Webster's Third New International Dictionary of the English Language Unabridged, p. 185 (1976).
Hildebrand David A.
Wilson Richard L.
Fuller Benjamin R.
Lund Valerie Ann
Vulcan Chemicals
Weinstein Louis
LandOfFree
Chlorine-destruct method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chlorine-destruct method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chlorine-destruct method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2418316