Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies
Patent
1997-10-15
2000-02-08
Niebling, John F.
Semiconductor device manufacturing: process
Bonding of plural semiconductor substrates
Subsequent separation into plural bodies
438460, 438462, 438928, H01L 2130, H01L 2146
Patent
active
060227915
ABSTRACT:
A serpentine pattern has been found to be effective at interrupting propagation of delamination cracks in thin film layers. The ring is provided on a semiconductor chip to suppress crack propagation from the chip edge. The ring is effective even though it is filled with metal, the serpentine pattern providing significantly increased area as compared with a standard linear crack stop that the energy for crack propagation is dissipated. In addition to serpentines, pattern features such as staggered filled ring patterns and connected rings will also be effective at reducing the propagation of delamination cracks from edge to active area by virtue of the increased area of interaction between the crack and the crack stop.
REFERENCES:
patent: 4455739 (1984-06-01), Hynecek
patent: 5096855 (1992-03-01), Vokoun, III
patent: 5217916 (1993-06-01), Anderson et al.
patent: 5266528 (1993-11-01), Yamada
patent: 5414297 (1995-05-01), Morita et al.
patent: 5477062 (1995-12-01), Natsume
patent: 5521125 (1996-05-01), Ormond et al.
patent: 5530280 (1996-06-01), White
patent: 5552345 (1996-09-01), Schrantz et al.
patent: 5834829 (1996-09-01), Dinkel et al.
Cook Robert Francis
Liniger Eric Gerhard
Mendelson Ronald Lee
Whiteside Richard Charles
International Business Machines - Corporation
Leas James M.
Niebling John F.
Zarneke David A.
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