Chemically treating the overcoat of a semiconductor device

Stock material or miscellaneous articles – Composite – Of silicon containing

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428446, 427 82, 427 93, 427387, H01L 2156, H01L 2330

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active

041736834

ABSTRACT:
A method of manufacturing a semiconductor device having a passivating overcoat of insulating material disposed thereover comprises treating the overcoat with a silane solution prior to encapsulating the device.

REFERENCES:
patent: 3447975 (1959-06-01), Bilo
patent: 3482977 (1969-12-01), Baker
patent: 3496427 (1970-02-01), Lee
patent: 3549368 (1970-12-01), Collins et al.
patent: 3586554 (1971-06-01), Couture
patent: 3788895 (1974-01-01), Schimmer
patent: 3911169 (1975-10-01), Lesaicherre
patent: 3946427 (1970-03-01), Iwasawa
patent: 4001870 (1977-01-01), Saiki
patent: 4017340 (1977-04-01), Yerman

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