Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-05-06
1994-08-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 430270, 528152, 528212, 525134, G03F 7023, G03F 730
Patent
active
053406877
ABSTRACT:
An alkali-soluble binder resin made by a condensation reaction of hydroxy styrene moiety having formulae (I) or (II): ##STR1## wherein x is an integer from 2 to 300; with a monomethylolated phenolic compound having a formula (III): ##STR2## wherein R.sub.1 and R.sub.2 are individually selected from the group consisting of lower alkyl group having 1-4 carbon atoms, lower alkoxy group having 1-4 carbon atoms, amino group, and carboxylic acid group; wherein R.sub.3 and R.sub.4 are individually selected from the group consisting of hydrogen, lower alkyl group having 1-4 carbon atoms, lower alkoxy groups having 1-4 carbon atoms, an amino group, and a carboxylic group; and wherein the mole ratio of the hydroxy styrene moiety to the monomethylolated phenolic compound is from about 1:10 to about 10:1.
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I. S. Fuksunaga, T. Kitaori, H. Koyanagi, S. Umeda and K. Nagasaiva; entitled "Diazonaphthequinone-sensitized Deep-UV Resist Materials", SPIE vol. 1672 Advances in Resist Technology and Processing IX (1992) pp. 647-659.
Bowers Jr. Charles L.
Chu John S.
OCG Microelectronic Materials Inc.
Simons William A.
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