Chemistry: electrical and wave energy – Processes and products
Patent
1979-11-21
1981-05-12
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
23232R, 23232E, 73 23, 204195P, 422 83, 422 88, 422 98, G01N 2746, G01N 2756
Patent
active
042670233
ABSTRACT:
A chemically integrating dosimeter for measuring gases, composed of a dual membrane system and an internal electrolyte solution. The outer membrane is a gas permeation rate controlling membrane. The inner membrane is a microporous hydrophobic protective membrane interposed between the electrolyte solution and the outer membrane. The dosimeter makes accurate determinations of time integrated exposures to various gases in the atmosphere and can be conveniently used by workers in industrial environments over a wide range of field conditions.
REFERENCES:
patent: 3098813 (1963-07-01), Beebe et al.
patent: 3227643 (1966-01-01), Okun et al.
patent: 3278408 (1966-10-01), Leonard et al.
patent: 3357908 (1967-12-01), Riseman et al.
patent: 3574078 (1971-04-01), Hynes et al.
patent: 3575836 (1971-04-01), Sternberg
patent: 3622488 (1971-11-01), Chand et al.
patent: 3649505 (1972-03-01), Strickler et al.
patent: 3668101 (1972-06-01), Bergman
patent: 3718546 (1973-02-01), Salzano et al.
patent: 3718563 (1973-02-01), Krull et al.
patent: 3730868 (1973-05-01), Niedrach
patent: 3756923 (1973-09-01), Dahms
patent: 3767552 (1973-10-01), Laurer
patent: 3787308 (1974-01-01), Malaspina et al.
patent: 3803006 (1974-04-01), Kreuger et al.
patent: 3830709 (1974-08-01), Kreuger et al.
patent: 3830718 (1974-08-01), Riseman et al.
patent: 3847777 (1974-11-01), Haddad et al.
patent: 3979274 (1976-09-01), Newman
patent: 3992153 (1976-11-01), Ferber et al.
patent: 4132616 (1979-01-01), Tantram et al.
Reiszner et al., "Environmental Sciences & Technology", vol. 7, No. 6, Jun. 1973, pp. 526-532.
Frant Martin S.
Soderberg Jon
Kaplan G. L.
Miller John B.
Orion Research Incorporated
LandOfFree
Chemically integrating dosimeter and gas analysis methods does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemically integrating dosimeter and gas analysis methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically integrating dosimeter and gas analysis methods will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2045081