Chemically enhanced thermal oxidation and nitridation of silicon

Details Chemically enhanced thermal oxidation and nitridation of silicon Chemically enhanced thermal oxidation and nitridation of silicon

1990-04-05

1991-08-27

Beck, S.

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428704, 4272553, 437239, 437241, 437242, C23C 2600

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active

050432249

ABSTRACT:
A process for enhanced thermal oxidation and nitridation of silicon by introduction of fluorine into the oxidation and nitridation ambients.

REFERENCES:
patent: 3607480 (1971-09-01), Harrp
patent: 3692571 (1972-09-01), Colton
patent: 4214919 (1980-07-01), Young
patent: 4300989 (1981-11-01), Chang
patent: 4567061 (1986-01-01), Hayashi
Morita et al, "Fluorine-Enhanced Thermal Oxidation of Silicon in the Presence of NF.sub.3 ", Appl. Phys. Letters 45(12), Dec. 15, 1984, pp. 1312-1314.

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