Chemical vaporizer for material deposition systems and...

Details Chemical vaporizer for material deposition systems and... Chemical vaporizer for material deposition systems and...

2011-02-08

2011-02-08

Chen, Bret (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C427S255280

Reexamination Certificate

active

07883745

ABSTRACT:
System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.

REFERENCES:
patent: 4584206 (1986-04-01), Sleighter
patent: 5376409 (1994-12-01), Kaloyeros et al.
patent: 5531188 (1996-07-01), Tomasulo
patent: 6159345 (2000-12-01), Donnelly et al.
patent: 6638346 (2003-10-01), Magni et al.
patent: 2003/0017610 (2003-01-01), Gerstel
patent: 2005/0137241 (2005-06-01), Kenda et al.
patent: 2007/0059447 (2007-03-01), Kim et al.
patent: 2007/0266941 (2007-11-01), Marsh et al.
patent: 0551847 (1993-01-01), None
patent: 2003-17462 (2003-01-01), None

Affiliated with

Also associated with

Rating

Chemical vaporizer for material deposition systems and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vaporizer for material deposition systems and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vaporizer for material deposition systems and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2647349