Chemical vapor trap and vacuum drying system including same

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

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34 92, 34 74, F26B 2106

Patent

active

052896412

ABSTRACT:
A chemical vapor trap for selectively removing harmful corrosive contaminants, such as water and acetic acid vapors, from an evacuating vapor phase in a vacuum drying system is provided. The chemical vapor trap includes a condenser section effective to convert a high temperature incoming heated sample liquids and heated vapor phase into a liquid phase condensate and a relatively lower room temperature stripped vapor phase. Liquid condensate including water and acetic acid are trapped below a chemical blanket or sealing layer which prevents re-vaporization or boiling of removed corrosive volatile contaminants from the vapor phase entering the vacuum pumps, promoting improved pump performance and extend pump service life.

REFERENCES:
patent: 83889 (1868-11-01), Taylor
patent: 288986 (1883-11-01), Dunlap et al.
patent: 735610 (1903-08-01), Stanton
patent: 746892 (1903-12-01), Stanton
patent: 3574950 (1971-04-01), Dantoni
patent: 3935646 (1976-02-01), Grandine et al.
patent: 3991481 (1975-11-01), Coraor et al.
patent: 4020563 (1977-05-01), Hoefer
patent: 4053990 (1977-10-01), Bielinski
patent: 4226669 (1980-10-01), Vilardi
patent: 4347671 (1982-09-01), Dias et al.
patent: 4612710 (1986-09-01), Fernwood et al.
patent: 4788778 (1988-12-01), Fernwood
patent: 4896434 (1990-01-01), Fanelli
patent: 5025571 (1991-06-01), Zlobinsky et al.
patent: 5040312 (1991-08-01), Holzel
patent: 5137604 (1992-08-01), Meeks et al.
Tom Falzareno, Technical Description of EMPROTECH's gel dryer system, Hyde Park, Mass.
BIO-RAD's Catalog, 220-221.
SAVANT'S Catalog, New York, 1989.
FISHER's Catalog.
BIO-RAD's Gel Dryer Owners Manual.

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