Coating apparatus – Gas or vapor deposition – Work support
Patent
1979-08-17
1981-03-17
Kaplan, Morris
Coating apparatus
Gas or vapor deposition
Work support
C23C 1100, H01L 2168
Patent
active
042560535
ABSTRACT:
A chemical vapor reaction system including a closed reaction vessel. The vessel forms a reaction chamber which has an axis of length and a cross-section normal to the axis. An end closure is removable to provide access to the reaction chamber. Reactant material is supplied to the reaction vessel through at least one reactant supply conduit, which discharges reactant to the reaction chamber, and an exhaust conduit removes degradation products and excess reactant from the vessel. A boat is placed in a reaction region in the vessel and supports substrates to be treated. The substrates are stacked parallel to and spaced from one another along the axis. The boat includes a distributor which is placed upstream from the substrates, between the supply conduit and the substrates so as to distribute the reactant as it enters the reaction region. The exhaust conduit draws from an exhaust region downstream from the boat, which exhaust region extends at least for the axial length of the stack of substrates.
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IBM Technical Disclosure Bulletin, vol. 13, No. 6, Nov. 1970, p. 1459, Eshback et al., "Emitter Diffusion System".
IBM Technical Disclosure Bulletin, vol. 19, No. 10, Mar. 1977, pp. 3734-3735, Clark et al., "Water Holder".
Kaplan Morris
Mon Donald D.
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