Chemical vapor reaction apparatus

Details Chemical vapor reaction apparatus Chemical vapor reaction apparatus

1987-09-16

1988-09-06

Pianalto, Bernard D.

Coating apparatus

Gas or vapor deposition

With treating means

118 50, 118600, C23C 1600

Patent

active

047684640

ABSTRACT:
An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source, an obturating plate is placed so that the intensity of the light source is apparently reduced at the center position. With this light, the substrate is irradiated with light having uniform intensity over the surface of the substrate to be processed.

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