Chemical vapor processing method for deposition or etching on a

Details Chemical vapor processing method for deposition or etching on a Chemical vapor processing method for deposition or etching on a

1989-08-21

1991-01-22

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 156643, B05D 512

Patent

active

049870050

ABSTRACT:
An improved method for manufacturing uniform films or etching uniformly on a plurality of substrates is shown. The substrates are vertically placed in a reaction chamber so as to be treated at once. A chemical vapor reaction takes place by virtue of a high frequency electric power which is modulated in its amplitude. By this modulation, the deposition or etching can be carried out over the surface of a susbtrate.

REFERENCES:
patent: 4357195 (1982-11-01), Gorin
patent: 4401507 (1983-08-01), Engle
patent: 4568563 (1986-02-01), Jackson et al.
patent: 4585516 (1986-04-01), Corn et al.

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