Chemical vapor infiltration method utilizing substantially diffu

Details Chemical vapor infiltration method utilizing substantially diffu Chemical vapor infiltration method utilizing substantially diffu

1991-12-16

1993-06-08

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

427249, 118715, 118719, 118725, C23C 806, C23C 1600, C23G 1654

Patent

active

052177556

ABSTRACT:
A porous substrate is placed inside an enclosure and a gas flow is injected into the enclosure under predetermined conditions of temperature and pressure to form a solid deposit within the accessible pores inside the substrate. A wall that is permeable to the gas flow is interposed on the path of the flow between its inlet into the enclosure and the substrate, the wall not being in contact with the substrate, thereby forming around the substrate a region which is free from strong turbulence so that infiltration is performed essentially under diffusion conditions, thereby minimizing the deposition gradient within the volume of the substrate.

REFERENCES:
patent: 4825809 (1989-05-01), Mieno
patent: 4837054 (1989-06-01), Schucker
patent: 4854263 (1989-08-01), Chang et al.
patent: 4901667 (1990-02-01), Suzuki et al.
patent: 4913090 (1990-04-01), Harada et al.

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