Chemical vapor deposition system cleaner

Brushing – scrubbing – and general cleaning – Machines – Brushing

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Details

1510405, 151042, 15246, 152465, 134 8, 134 10, 134 221, 134166R, B08B 908

Patent

active

051095629

ABSTRACT:
An apparatus for cleaning the interior surfaces of a vessel which includes a cleaning head supported and guided into the vessel by a rigid air shaft. The cleaning head is supplied with a process fluid and directs and removes the process fluid from a cleaning zone located on the interior surface of the vessel. The process fluid is heated by a heat exchanger hose assembly that is connected to the air shaft. The apparatus utilizes turbulent fluid flow, thermal shock, ultrasonic vibration and/or piezoelectric vibration to dislodge particulates from the inner surfaces of the vessel. The apparatus is useful for cleaning chemical vapor deposition reactors and other similar vessels.

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Cheung, S. D. et al., "Monitor Particles in Real Time to Sleuth Contamination Sources", Semiconductor International, Oct. 1988, pp. 98-102.
Gill, P. and Dillenbeck, K., "Using Snake Patterns to Monitor Defects and Enhance VLSI Device Yields", Microcontamination, Mar. 1989, pp. 33-36, 60.

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