Brushing – scrubbing – and general cleaning – Machines – Brushing
Patent
1990-08-29
1992-05-05
Roberts, Edward L.
Brushing, scrubbing, and general cleaning
Machines
Brushing
1510405, 151042, 15246, 152465, 134 8, 134 10, 134 221, 134166R, B08B 908
Patent
active
051095629
ABSTRACT:
An apparatus for cleaning the interior surfaces of a vessel which includes a cleaning head supported and guided into the vessel by a rigid air shaft. The cleaning head is supplied with a process fluid and directs and removes the process fluid from a cleaning zone located on the interior surface of the vessel. The process fluid is heated by a heat exchanger hose assembly that is connected to the air shaft. The apparatus utilizes turbulent fluid flow, thermal shock, ultrasonic vibration and/or piezoelectric vibration to dislodge particulates from the inner surfaces of the vessel. The apparatus is useful for cleaning chemical vapor deposition reactors and other similar vessels.
REFERENCES:
patent: 1869730 (1932-08-01), Antle
patent: 3774262 (1973-11-01), Anthony et al.
patent: 3946459 (1976-03-01), Armstrong
patent: 4266316 (1981-05-01), Schneider et al.
patent: 4426566 (1984-01-01), Coughlin et al.
patent: 4473921 (1984-10-01), Weber et al.
patent: 4486238 (1984-12-01), Bando
patent: 4500492 (1985-02-01), Yamakawa
patent: 4543684 (1985-10-01), Bandoh et al.
patent: 4720889 (1988-01-01), Grave
patent: 4792363 (1988-12-01), Franklin, Jr. et al.
Cheung, S. D. et al., "Monitor Particles in Real Time to Sleuth Contamination Sources", Semiconductor International, Oct. 1988, pp. 98-102.
Gill, P. and Dillenbeck, K., "Using Snake Patterns to Monitor Defects and Enhance VLSI Device Yields", Microcontamination, Mar. 1989, pp. 33-36, 60.
C.V.D. System Cleaners Corporation
Roberts Edward L.
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