Chemical vapor deposition reactor

Details Chemical vapor deposition reactor Chemical vapor deposition reactor

1986-08-27

1989-06-13

Doll, John

Chemical apparatus and process disinfecting, deodorizing, preser

Physical type apparatus

Crystallizer

118725, 118730, C30B 3500

Patent

active

048391450

ABSTRACT:
A reactor, suitable for CVD processes, which presents a high aspect ratio to reactant gasses, is described. Substrates are mounted on oppositely disposed susceptors in a vertical chimney-type reactor. Means are provided to rotate the susceptors about an axis perpendicular to gas flow. Side-loading or top-loading mechanisms are provided for loading and unloading the susceptors through a gate valve. A diffuser below the reaction zone adjusts the gas flow into the reaction zone.

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Leys et al., "Growth of Multiple Thin Layer Structures . . . ", J. Crys. Growth 68 (1984) 431-436.
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