Chemical vapor deposition process employing metal pentadienyl co

Details Chemical vapor deposition process employing metal pentadienyl co Chemical vapor deposition process employing metal pentadienyl co

1993-05-14

1994-10-04

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427252, C23C 1600

Patent

active

053524888

ABSTRACT:
Vapor deposition of metal films is carried out using as precursors metal compounds or complexes based on open pentadienyls and derivatives. The technique can be used favorably for transition metal depositions, and can be carried out photolytically or thermolytically. In certain cases, oxygen can be substituted for a terminal carbon atom.

REFERENCES:
Kirss, R. U., "Electrocyclic Reactions of Open Metallocenes: Carbon-Carbon Bond Formation during Thermolysis of Bis(2,4-dimethyl-1,3-pentadienyl) ruthenium and-osmium" Organometallics, 11(2) 1992, 497-499.
Stauf et al., "Patterned Photoassisted Organometallic Deposition of Iron, Nickel & Palladium On Silicon", 156 (1988) pp. L31-L36.
Ernst, Richard D., "Structural & Reactivity Patterns in Transition-Metal-Pentadienyl Chemistry", Chem. Rev. 1988, 88, 1255-1291.

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