Chemical vapor deposition of titanium nitride and like films

Details Chemical vapor deposition of titanium nitride and like films Chemical vapor deposition of titanium nitride and like films

1983-10-28

1985-08-13

Morgenstern, Norman

Coating processes

Coating has x-ray, ultraviolet, or infrared properties

427166, 4272552, 65 601, B05B 500, B05D 500

Patent

active

045350000

ABSTRACT:
A novel process for placing a thin film of a metal nitride, e.g. titanium nitride, on a glass substrate by mixing a metal halide with a reducing gas like ammonia, preferably within a range of from about 250.degree. C. to 320.degree. C., and then reacting the gases at the surface of a glass substrate heated to, e.g., about 400.degree. C. to about 700.degree. C. to form the film on the glass.

REFERENCES:
patent: 3885855 (1975-05-01), Gross
patent: 4101703 (1978-07-01), Schintlmeister

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