Chemical vapor deposition of metal sulfide films from metal thio

Details Chemical vapor deposition of metal sulfide films from metal thio Chemical vapor deposition of metal sulfide films from metal thio

1996-02-27

1998-11-17

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

427 69, 427255, 4272551, 4272552, 427314, 4271261, 4271262, 4273722, C23C 1600, B05D 512

Patent

active

058373209

ABSTRACT:
In a method of depositing a metal sulfide film on a substrate a solution containing at least one metal compound precursor comprising at least one thiocarboxylate ligand SECR, wherein E is selected from the group consisting of O and S and wherein R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl is prepared. The substrate is heated to a reaction temperature. The solution is evaporated to form vapors of the metal compound precursor. The vapors and the substrate heated to the reaction temperature are contacted. The reaction temperature is sufficient to decompose the metal compound precursor to form a metal sulfide film of at least one metal on the substrate.

REFERENCES:
patent: 4812233 (1989-03-01), Micheli
patent: 4885188 (1989-12-01), Hasegawa et al.
patent: 4981712 (1991-01-01), Yamamoto et al.
patent: 5077092 (1991-12-01), Smith et al.
patent: 5110622 (1992-05-01), Hasegawa et al.
patent: 5185181 (1993-02-01), Mikami et al.
patent: 5266355 (1993-11-01), Wernberg et al.
patent: 5275840 (1994-01-01), Mikami et al.
patent: 5298295 (1994-03-01), Winter et al.
patent: 5372839 (1994-12-01), Mikami et al.
patent: 5425966 (1995-06-01), Winter et al.
Masao Aozasa et al; Jpn. J. Appl. Phys. vol. 29, No. 10, pp. 1997-2002.
Yoshiki Chubachi et al; Jpn. J. Appl. Phys. Part I, vol. 31, No. 1 (1992); pp. 60-66.
Takoa Tohda et al; Jpn. J. Appl. Phys. 30(11A), Nov. 1991, pp. 2786-2790.
R.H. Mauch et al; Journal of Crystal Growth 117 (1992); pp. 964-968.
M. Tammenmaa; Ph.D. Thesis Sponsored by the Academy of Finland; 1989; Abstr. No. N89-28613.

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