Chemical vapor deposition of metal chalcogenide films

Coating processes – Direct application of electrical – magnetic – wave – or... – Chemical vapor deposition

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4272481, 427255, 427294, 427295, 427314, 427318, C23C 1600

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active

052982955

ABSTRACT:
A process for depositing a film of metal chalcogenide is disclosed. The process comprises providing a single source of a metal chalcogenide and heating said source to a temperature sufficient to sublime the single source under a pressure ranging from 0.0001 to 760 torr so that the sublimate is delivered into a reaction zone. Within this reaction zone, a substrate is deposed upon which deposition may occur. The reaction zone is heated to approximately 200.degree. to 800.degree. C. The sublimate is passed through this reaction zone and over the substrate to produce a thin film of metal chalcogenide which is deposited upon the substrate.

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