Chemical vapor deposition of luminescent films

Details Chemical vapor deposition of luminescent films Chemical vapor deposition of luminescent films

1973-07-23

1976-10-05

Gwinnell, Harry J.

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

2523014F, 2523014R, 2523016F, 2523016R, 313467, 427248, 427255, B05D 512

Patent

active

039845877

ABSTRACT:
Method for depositing a luminescent film upon a substrate comprising vaporizing into a nonreactive carrier gas (1) at least one member of a first group consisting of hydrides and alkyls of M.sup.1, wherein M.sup.1 is at least one of silicon, germanium, boron, phosphorus, and aluminum, (2) at least one volatile M.sup.2 -containing organo-metallic compound of a second group, wherein M.sup.2 is at least one of zinc, cadmium, magnesium, calcium, beryllium, strontium, or barium, and (3) at least one volatile M.sup.3 -containing organo-metallic compound of a third group, wherein M.sup.3 is at least one activator for said luminescent film. The vapor-laden carrier gas and the oxidizing gas are contacted with the substrate which is at temperatures in the range of about 300.degree. to 700.degree.C. The reaction is continued unitl the desired thickness of luminescent film is achieved.

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