Chemical vapor deposition of II/VI semiconductor material using

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4272551, 4272552, 427255, 148DIG64, B32B 900, C23C 1600

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058828052

ABSTRACT:
Triisopropylindium ((CH.sub.3).sub.2 CH).sub.3 In is used as an n-type dopant for II/VI semiconductor materials. This dopant precursor is particularly suited for indium doping of II/V semiconductor materials at low carrier concentrations in the range of the low 10.sup.15 cm.sup.-3 and does not exhibit an appreciable memory effect.

REFERENCES:
patent: 5028561 (1991-07-01), Kamath et al.
patent: 5273931 (1993-12-01), Taskar et al.
patent: 5318666 (1994-06-01), Elkind et al.
Journal of Electronic Materials, vol. 22, No. 8 Korenstein et al. published un., 1993, "Indium Doping of HgCdTe Grown by Metalorganic Chemical Vapor Deposition-Direct Alloy Growth Using Triisopropylindium and Diisopropyltellurium Adduct" pp. 853-587.
Journal of Electronic Materials, vol. 22, No. 8 S.J.C. Irvine et al. published Jun. 1993. "A New N-Type Doping Precursor for MOCVD-IMP Growth Detector Quality MCT" pp. 859-864.
Journal of Crystal Growth, vol. 124, Nos. 1-4 pp. 88-92 Chen et al. published Aug. 1992. "Triisopropylindium for OMVPE Growth".

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