Chemical vapor deposition of group IIIB metals

Details Chemical vapor deposition of group IIIB metals Chemical vapor deposition of group IIIB metals

1988-06-22

1989-11-21

Silverman, Stanley

Coating processes

Heat decomposition of applied coating or base material

Coating decomposed to form metal

427252, 4272551, 4272552, 4272553, B05D 302

Patent

active

048822060

ABSTRACT:
Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula (I) ##STR1## where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula I is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula I and a heat decomposable tellurium compound under nonoxidizing conditions.

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patent: 3856581 (1974-12-01), Smeggil et al.
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patent: 4510182 (1985-04-01), Cornils et al.
Devyathykh, G. G. et al, Zhurnal Neorganicheskol Khimii, vol. 25, pp. 2109-2112 (1980) English Translation).

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